METHOD FOR IMPROVING THE ACCURACY OF AN ETCHED SILICON PATTERN USING MASK COMPENSATION

Details for Australian Patent Application No. 2003290593 (hide)

Owner SOPHIA WIRELESS, INC.

Inventors NEMETH, David, T.; KOH, Philip, J.

Pub. Number AU-A-2003290593

PCT Number PCT/US2003/0350

PCT Pub. Number WO2004/045869

Priority 60/426,528 15.11.02 US

Filing date 13 November 2003

Wipo publication date 15 June 2004

International Classifications

B44C 001/22 Processes, not specifically provided for elsewhere, for producing decorative surface effects - Removing surface-material, e.g. by engraving, by etching

C23F 001/02 Etching metallic material by chemical means - Local etching

H01L 021/308 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Event Publications

8 April 2004 Complete Application Filed

  Priority application(s): 60/426,528 15.11.02 US

15 July 2004 Application Open to Public Inspection

  Published as AU-A-2003290593

4 August 2005 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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