ABERRATION MEASURING METHOD, EXPOSURE METHOD AND EXPOSURE SYSTEM

Details for Australian Patent Application No. 2003289427 (hide)

Owner NIKON CORPORATION

Inventors HAGIWARA, Tsuneyuki

Pub. Number AU-A-2003289427

PCT Number PCT/JP2003/0162

PCT Pub. Number WO2004/059710

Priority 2002-371258 24.12.02 JP

Filing date 18 December 2003

Wipo publication date 22 July 2004

International Classifications

H01L 021/027 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

G03F 007/20 Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces - Exposure

G01M 011/02 Testing of optical apparatus - Testing of optical properties

Event Publications

1 April 2004 Complete Application Filed

  Priority application(s): 2002-371258 24.12.02 JP

26 August 2004 Application Open to Public Inspection

  Published as AU-A-2003289427

8 September 2005 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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