DAMASCENE GATE PROCESS WITH SACRIFICIAL OXIDE IN SEMICONDUCTOR DEVICES

Details for Australian Patent Application No. 2003286831 (hide)

Owner ADVANCED MICRO DEVICES, INC.

Inventors AHMED, Shibly, S.; WANG, Haihong; YU, Bin

Pub. Number AU-A-2003286831

PCT Number PCT/US2003/0347

PCT Pub. Number WO2004/053963

Priority 10/310,777 06.12.02 US

Filing date 30 October 2003

Wipo publication date 30 June 2004

International Classifications

H01L 021/28 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

H01L 021/336 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

H01L 029/423 Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having at least one potential-jump barrier or surface barrier

H01L 029/786 Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having at least one potential-jump barrier or surface barrier

Event Publications

1 April 2004 Complete Application Filed

  Priority application(s): 10/310,777 06.12.02 US

5 August 2004 Application Open to Public Inspection

  Published as AU-A-2003286831

25 August 2005 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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