HIGH DEPOSITION RATE SPUTTERING

Details for Australian Patent Application No. 2003285072 (hide)

Owner ZOND, INC

Inventors CHISTYAKOV, Roman

Pub. Number AU-A-2003285072

PCT Number PCT/US2003/0342

PCT Pub. Number WO2004/044261

Priority 10/065,739 14.11.02 US

Filing date 29 October 2003

Wipo publication date 3 June 2004

International Classifications

C23C 014/35 Coating by vacuum evaporation, by sputtering or by ion implantation - by application of a magnetic field, e.g. magnetron sputtering

Event Publications

1 April 2004 Complete Application Filed

  Priority application(s): 10/065,739 14.11.02 US

8 July 2004 Application Open to Public Inspection

  Published as AU-A-2003285072

28 July 2005 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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