CONTAMINANT REMOVING METHOD AND DEVICE, AND EXPOSURE METHOD AND APPARATUS

Details for Australian Patent Application No. 2003284672 (hide)

Owner NIKON CORPORATION

Inventors WATANABE, Shunji; HAMATANI, Masato; KITAMOTO, Tatsuya

Pub. Number AU-A-2003284672

PCT Number PCT/JP2003/0149

PCT Pub. Number WO2004/050266

Priority 2003-115098 18.04.03 JP; 2002-350944 03.12.02 JP

Filing date 25 November 2003

Wipo publication date 23 June 2004

International Classifications

B08B 003/08 Cleaning by methods involving the use or presence of liquid or steam - the liquid having chemical or dissolving effect

G03F 007/20 Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces - Exposure

G02B 003/00 Simple or compound lenses

G03F 007/22 Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces - Exposing sequentially with the same light pattern different positions of the same surface

H01L 021/027 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Event Publications

25 March 2004 Complete Application Filed

  Priority application(s): 2003-115098 18.04.03 JP; 2002-350944 03.12.02 JP

29 July 2004 Application Open to Public Inspection

  Published as AU-A-2003284672

18 August 2005 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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