PRODUCTION METHOD FOR EXPOSURE SYSTEM, LIGHT SOURCE UNIT, EXP0SRUE SYSTEM, EXPOSURE METHOD AND ADJUSTMENT METHOD FOR EXPOSURE SYSTEM

Details for Australian Patent Application No. 2003284658 (hide)

Owner NIKON CORPORATION

Inventors TAKENAKA, Shuji

Pub. Number AU-A-2003284658

PCT Number PCT/JP2003/0149

PCT Pub. Number WO2004/049409

Priority 2002-341226 25.11.02 JP; 2003-65644 11.03.03 JP; 2003-133045 12.05.03 JP

Filing date 25 November 2003

Wipo publication date 18 June 2004

International Classifications

H01L 021/027 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

G02B 019/00 Condensers

G03F 007/20 Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces - Exposure

Event Publications

25 March 2004 Complete Application Filed

  Priority application(s): 2002-341226 25.11.02 JP; 2003-65644 11.03.03 JP; 2003-133045 12.05.03 JP

22 July 2004 Application Open to Public Inspection

  Published as AU-A-2003284658

11 August 2005 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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