EXPOSURE SYSTEM, EXPOSURE METHOD, AND DEVICE FABRICATING METHOD

Details for Australian Patent Application No. 2003284540 (hide)

Owner NIKON CORPORATION

Inventors SHIRAISHI, Naomasa

Pub. Number AU-A-2003284540

PCT Number PCT/JP2003/0154

PCT Pub. Number WO2004/051716

Priority 2002-351336 03.12.02 JP

Filing date 2 December 2003

Wipo publication date 23 June 2004

International Classifications

H01L 021/027 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

G03F 007/20 Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces - Exposure

Event Publications

25 March 2004 Complete Application Filed

  Priority application(s): 2002-351336 03.12.02 JP

29 July 2004 Application Open to Public Inspection

  Published as AU-A-2003284540

18 August 2005 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

Legal

The information provided by the Site not in the nature of legal or other professional advice. The information provided by the Site is derived from third parties and may contain errors. You must make your own enquiries and seek independent advice from the relevant industry professionals before acting or relying on any information contained herein. Check the above data against the Australian Patent Office AUSPAT database.

Next and Previous Patents/Applications

2003284541-CONTENT REPRODUCTION DEVICE

2003284539-COPPER OXIDE ULTRAFINE PARTICLE