PLASMA PROCESSING EQUIPMENT

Details for Australian Patent Application No. 2003281401 (hide)

Owner OHMI, Tadahiro TOKYO ELECTRON LIMITED

Inventors HIRAYAMA, Masaki; GOTO, Tetsuya; OHMI, Tadahiro

Pub. Number AU-A-2003281401

PCT Number PCT/JP2003/0084

PCT Pub. Number WO2004/006319

Priority 2002-197227 05.07.02 JP

Filing date 3 July 2003

Wipo publication date 23 January 2004

International Classifications

C23C 016/511 Chemical deposition or plating by decomposition

H05H 001/46 Generating plasma - using applied electromagnetic fields, e.g. high frequency or microwave energy

H01L 021/31 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Event Publications

4 March 2004 Complete Application Filed

  Priority application(s): 2002-197227 05.07.02 JP

11 March 2004 Application Open to Public Inspection

  Published as AU-A-2003281401

21 July 2005 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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