ORGANIC SILOXANE COPOLYMER FILM, METHOD AND DEPOSITION APPARATUS FOR PRODUCING SAME, AND SEMICONDUCTOR DEVICE USING SUCH COPOLYMER FILM

Details for Australian Patent Application No. 2003281110 (hide)

Owner NEC CORPORATION

Inventors HAYASHI, Yoshihiro

Pub. Number AU-A-2003281110

PCT Number PCT/JP2003/0089

PCT Pub. Number WO2004/008517

Priority 2002-205468 15.07.02 JP

Filing date 15 July 2003

Wipo publication date 2 February 2004

International Classifications

H01L 021/312 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

H01L 021/768 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

C08F 230/08 Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium, or a metal

C08F 236/22 Copolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds

C08G 061/12

C23C 014/12 Coating by vacuum evaporation, by sputtering or by ion implantation - Organic material

Event Publications

4 March 2004 Complete Application Filed

  Priority application(s): 2002-205468 15.07.02 JP

18 March 2004 Application Open to Public Inspection

  Published as AU-A-2003281110

21 July 2005 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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