ACRYLIC COPOLYMER AND RADIATION-SENSITIVE RESIN COMPOSITION

Details for Australian Patent Application No. 2003280710 (hide)

Owner JSR CORPORATION

Inventors ISHII, Hiroyuki; FUJIWARA, Kouichi; YAMAGUCHI, Hiroshi; NISHIMURA, Yukio

Pub. Number AU-A-2003280710

PCT Number PCT/JP03/14051

PCT Pub. Number WO2004/041879

Priority 2002-320697 05.11.02 JP; 2002-330870 14.11.02 JP

Filing date 4 November 2003

Wipo publication date 7 June 2004

International Classifications

C08F 220/10 Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide, or nitrile thereof

G03F 007/039 Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces - Macromolecular compounds which are photodegradable, e.g. positive electron resists

Event Publications

4 March 2004 Complete Application Filed

  Priority application(s): 2002-320697 05.11.02 JP; 2002-330870 14.11.02 JP

1 July 2004 Application Open to Public Inspection

  Published as AU-A-2003280710

21 July 2005 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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