NEGATIVE TYPE PHOTOSENSITIVE RESIN COMPOSITION

Details for Australian Patent Application No. 2003280695 (hide)

Owner ASAHI GLASS COMPANY, LIMITED

Inventors TAKAHASHI, Hideyuki; ISHIZEKI, Kenji

Pub. Number AU-A-2003280695

PCT Number PCT/JP03/14019

PCT Pub. Number WO2004/042474

Priority 2002-322215 06.11.02 JP

Filing date 31 October 2003

Wipo publication date 7 June 2004

International Classifications

G03F 007/038 Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces - Macromolecular compounds which are rendered insoluble or differentially wettable

G03F 007/027 Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces - Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds

G03F 007/004 Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces - Photosensitive materials

Event Publications

4 March 2004 Complete Application Filed

  Priority application(s): 2002-322215 06.11.02 JP

1 July 2004 Application Open to Public Inspection

  Published as AU-A-2003280695

21 July 2005 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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