RADIATION-SENSITIVE RESIN COMPOSITION

Details for Australian Patent Application No. 2003280571 (hide)

Owner JSR CORPORATION

Inventors NISHIMURA, Yukio; ISHII, Hiroyuki; NISHIMURA, Isao; KOBAYASHI, Eiichi

Pub. Number AU-A-2003280571

PCT Number PCT/JP03/13560

PCT Pub. Number WO2004/040376

Priority 2002-315021 29.10.02 JP; 2003-192477 04.07.03 JP

Filing date 23 October 2003

Wipo publication date 25 May 2004

International Classifications

G03F 007/039 Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces - Macromolecular compounds which are photodegradable, e.g. positive electron resists

Event Publications

26 February 2004 Complete Application Filed

  Priority application(s): 2002-315021 29.10.02 JP; 2003-192477 04.07.03 JP

24 June 2004 Application Open to Public Inspection

  Published as AU-A-2003280571

21 July 2005 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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