Owner Ishikawajima-Harima Heavy Industries Co Ltd

Inventors Takagi, Tomoko; Ueda, Masashi; Ito, Norikazu

Agent Blake Dawson Patent Attorneys

Pub. Number AU-B-2003280561

PCT Number PCT/JP03/13205

PCT Pub. Number WO2004/036634

Priority 2002-304652 18.10.02 JP

Filing date 15 October 2003

Wipo publication date 4 May 2004

Acceptance publication date 4 September 2008

C23C 16/44 (2006.01) Chemical deposition or plating by decomposition - characterised by the method of coating

C23C 16/54 (2006.01) Chemical deposition or plating by decomposition - Apparatus specially adapted for continuous coating

H01L 21/205 (2006.01) Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

H01L 31/04 (2006.01) Semiconductor devices sensitive to infra-red radiation, light, electromagnetic radiation of shorter wavelength, or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation - adapted as conversion devices

H05H 1/24 (2006.01) Generating plasma - Generating plasma

H05H 1/46 (2006.01) Generating plasma - using applied electromagnetic fields, e.g. high frequency or microwave energy