EXTREME ULTRAVIOLET LIGHT EXPOSURE SYSTEM AND VACUUM CHAMBER

Details for Australian Patent Application No. 2003277515 (hide)

Owner NIKON CORPORATION

Inventors MURAKAMI, Katsuhiko

Pub. Number AU-A-2003277515

PCT Number PCT/JP03/13515

PCT Pub. Number WO2004/038773

Priority 2002/311741 25.10.02 JP

Filing date 23 October 2003

Wipo publication date 13 May 2004

International Classifications

H01L 021/027 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

G03F 007/20 Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces - Exposure

G21K 001/06 Arrangements for handling radiation or particles, e.g. focusing, moderating

Event Publications

19 February 2004 Complete Application Filed

  Priority application(s): 2002/311741 25.10.02 JP

17 June 2004 Application Open to Public Inspection

  Published as AU-A-2003277515

14 July 2005 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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