EXPOSURE DEVICE, EXPOSURE SYSTEM, RECIPE GENERATION SYSTEM, AND DEVICE MANUFACTURING METHOD

Details for Australian Patent Application No. 2003277497 (hide)

Owner NIKON CORPORATION

Inventors SUZUKI, Hiroyuki; NAKAI, Mitsuhiro; HIRAOKA, Akira

Pub. Number AU-A-2003277497

PCT Number PCT/JP03/12913

PCT Pub. Number WO2004/034448

Priority 2002/296276 09.10.02 JP

Filing date 8 October 2003

Wipo publication date 4 May 2004

International Classifications

H01L 021/027 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

G03F 007/20 Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces - Exposure

Event Publications

19 February 2004 Complete Application Filed

  Priority application(s): 2002/296276 09.10.02 JP

3 June 2004 Application Open to Public Inspection

  Published as AU-A-2003277497

14 July 2005 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

25 August 2005 Corrigenda

  Applications OPI - Name Index Under the name NIKON CORPORATION, Application No. 2003277497, under INID (71) correct the name to read NIKON SYSTEMS INC.; NIKON CORPORATION

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