ELECTRON BEAM EXPOSURE SYSTEM

Details for Australian Patent Application No. 2003276779 (hide)

Owner MAPPER LITHOGRAPHY IP B.V.

Inventors VAN VEEN, Alexander, Hendrik, Vincent; KRUIT, Pieter; WIELAND, Marco, Jan-Jaco; KAMPHERBEEK, Bert, Jan

Pub. Number AU-A-2003276779

PCT Number PCT/NL03/00745

PCT Pub. Number WO2004/040614

Priority 60/422,758 30.10.02 US

Filing date 30 October 2003

Wipo publication date 25 May 2004

International Classifications

H01J 037/302 Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof

G03F 007/20 Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces - Exposure

H01J 037/317 Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof - for changing properties of the objects or for applying thin layers thereon, e.g. ion implantation

H01J 037/304 Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof

Event Publications

19 February 2004 Complete Application Filed

  Priority application(s): 60/422,758 30.10.02 US

24 June 2004 Application Open to Public Inspection

  Published as AU-A-2003276779

14 July 2005 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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