METHOD AND APPARATUS FOR AN IMPROVED BAFFLE PLATE IN A PLASMA PROCESSING SYSTEM

Details for Australian Patent Application No. 2003276601 (hide)

Owner TOKYO ELECTRON LIMITED

Inventors SAIGUSA, Hidehito; TAKASE, Taira; MITSUHASHI, Kouji; NAKAYAMA, Hiroyuki

Pub. Number AU-A-2003276601

PCT Number PCT/IB03/05249

PCT Pub. Number WO2004/030015

Priority 10/259,380 30.09.02 US

Filing date 29 September 2003

Wipo publication date 19 April 2004

International Classifications

H01J 037/00 Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof

Event Publications

19 February 2004 Complete Application Filed

  Priority application(s): 10/259,380 30.09.02 US

20 May 2004 Application Open to Public Inspection

  Published as AU-A-2003276601

14 July 2005 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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