HYDRIDE VPE REACTOR

Details for Australian Patent Application No. 2003276032 (hide)

Owner AIXTRON AG

Inventors KAPPELER, Johannes

Pub. Number AU-A-2003276032

PCT Number PCT/EP03/10953

PCT Pub. Number WO2004/035878

Priority 102 47 921.6 10.10.02 DE

Filing date 2 October 2003

Wipo publication date 4 May 2004

International Classifications

C30B 025/14 Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour deposition growth - Feed and outlet means for the gases

C30B 025/08 Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour deposition growth - Reaction chambers

C23C 016/448 Chemical deposition or plating by decomposition - characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials

Event Publications

19 February 2004 Complete Application Filed

  Priority application(s): 102 47 921.6 10.10.02 DE

10 June 2004 Application Open to Public Inspection

  Published as AU-A-2003276032

14 July 2005 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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