ELECTRON BEAM EXPOSURE METHOD AND ELECTRON BEAM EXPOSURE SYSTEM

Details for Australian Patent Application No. 2003275640 (hide)

Owner MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.

Inventors ITO, Eiichi; TSUKUDA, Masahiko

Pub. Number AU-A-2003275640

PCT Number PCT/JP03/13599

PCT Pub. Number WO2004/038508

Priority 2002-312434 28.10.02 JP

Filing date 24 October 2003

Wipo publication date 13 May 2004

International Classifications

G03F 007/20 Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces - Exposure

H01L 021/027 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

G11B 007/26 Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation, reproducing using an optical beam at lower power - Apparatus or processes specially adapted for the manufacture of record carriers

Event Publications

12 February 2004 Complete Application Filed

  Priority application(s): 2002-312434 28.10.02 JP

17 June 2004 Application Open to Public Inspection

  Published as AU-A-2003275640

14 July 2005 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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