FORMATION OF A RELAXED USEFUL LAYER FROM A WAFER WITH NO BUFFER LAYER

Details for Australian Patent Application No. 2003274477 (hide)

Owner S.O.I.TEC SILICON ON INSULATOR TECHNOLOGIES

Inventors GHYSELEN, Bruno; AKATSU, Takeshi

Pub. Number AU-A-2003274477

PCT Number PCT/IB03/04793

PCT Pub. Number WO2004/027858

Priority 0211543 18.09.02 FR; 60/439,429 24.12.02 US

Filing date 17 September 2003

Wipo publication date 8 April 2004

International Classifications

H01L 021/762 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Event Publications

12 February 2004 Complete Application Filed

  Priority application(s): 0211543 18.09.02 FR; 60/439,429 24.12.02 US

20 May 2004 Application Open to Public Inspection

  Published as AU-A-2003274477

14 July 2005 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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