SEMICONDUCTOR DEVICE FABRICATION CHAMBER CLEANING METHOD AND APPARATUS WITH RECIRCULATION OF CLEANING GAS

Details for Australian Patent Application No. 2003273232 (hide)

Owner APPLIED MATERIALS INC.

Inventors PORSHNEV, Peter, I.; NOWAK, Thomas; SHAMOUILIAN, Shamouil; LAI, Canfeng; COX, Michael, Santiago; KRISHNARAJ, Padmanabhan; TANAKA, Tsutomu; RAOUX, Sebastien

Pub. Number AU-A-2003273232

PCT Number PCT/US03/17339

PCT Pub. Number WO2003/101635

Priority 10/159,794 30.05.02 US

Filing date 30 May 2003

Wipo publication date 19 December 2003

International Classifications

B08B 007/00 Cleaning by methods not provided for in a single other subclass or a single group in this subclass

C23C 016/44 Chemical deposition or plating by decomposition - characterised by the method of coating

H01J 037/32 Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof - Gas-filled discharge tubes

Event Publications

5 February 2004 Complete Application Filed

  Priority application(s): 10/159,794 30.05.02 US

12 February 2004 Application Open to Public Inspection

  Published as AU-A-2003273232

14 July 2005 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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