NANOSTRUCTURED AND NANOPOROUS FILM COMPOSITIONS, STRUCTURES, AND METHODS FOR MAKING THE SAME

Details for Australian Patent Application No. 2003272778 (hide)

Owner EKC TECHNOLOGY, INC.

Inventors SVENDSEN, Leo, G.; MUKHERJEE, Shyama, P.; ROMAN, Paul, J., Jr.; HILL, Ross, H.; MADSEN, Harold, O.; ZHANG, Xin; HOHERTZ, Donna

Pub. Number AU-A-2003272778

PCT Number PCT/US03/30736

PCT Pub. Number WO2004/030830

Priority 10/261,197 30.09.02 US

Filing date 26 September 2003

Wipo publication date 23 April 2004

International Classifications

B05D 001/02 Processes for applying liquids or other fluent materials - performed by spraying

B05D 001/18 Processes for applying liquids or other fluent materials - performed by dipping

B05D 003/00 Pretreatment of surfaces to which liquids or other fluent materials are to be applied

B05D 003/02 Pretreatment of surfaces to which liquids or other fluent materials are to be applied - by baking

B05D 003/06 Pretreatment of surfaces to which liquids or other fluent materials are to be applied - by exposure to radiation

B05D 005/00 Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures

C23C 014/04 Coating by vacuum evaporation, by sputtering or by ion implantation - Coating on selected surface areas, e.g. using masks

C23C 014/06 Coating by vacuum evaporation, by sputtering or by ion implantation - characterised by the coating material

C23C 014/08 Coating by vacuum evaporation, by sputtering or by ion implantation - Oxides

C23C 014/14 Coating by vacuum evaporation, by sputtering or by ion implantation - Metallic material, boron or silicon

C23C 014/28 Coating by vacuum evaporation, by sputtering or by ion implantation - by wave energy or particle radiation

H05H 001/00 Generating plasma

H05H 001/24 Generating plasma - Generating plasma

Event Publications

22 January 2004 Complete Application Filed

  Priority application(s): 10/261,197 30.09.02 US

27 May 2004 Application Open to Public Inspection

  Published as AU-A-2003272778

7 July 2005 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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