METHOD AND APPARATUS FOR AN IMPROVED DEPOSITION SHIELD IN A PLASMA PROCESSING SYSTEM

Details for Australian Patent Application No. 2003272031 (hide)

Owner TOKYO ELECTRON LIMITED

Inventors SAIGUSA, Hidehito; TAKASE, Taira; MITSUHASHI, Kouji; NAKAYAMA, Hiroyuki

Pub. Number AU-A-2003272031

PCT Number PCT/IB03/04808

PCT Pub. Number WO2004/030426

Priority 10/259,353 30.09.02 US

Filing date 29 September 2003

Wipo publication date 19 April 2004

International Classifications

H05H 001/00 Generating plasma

Event Publications

22 January 2004 Complete Application Filed

  Priority application(s): 10/259,353 30.09.02 US

20 May 2004 Application Open to Public Inspection

  Published as AU-A-2003272031

7 July 2005 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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