COMPOSITION FOR FORMING ANTIREFLECTION FILM FOR LITHOGRAPHY

Details for Australian Patent Application No. 2003271123 (hide)

Owner NISSAN CHEMICAL INDUSTRIES, LTD.

Inventors KISHIOKA, Takahiro; MIZUSAWA, Ken-ichi; ENOMOTO, Tomoyuki; SAKAMOTO, Rikimaru; NAKAYAMA, Keisuke; KAWAMURA, Yasuo

Pub. Number AU-A-2003271123

PCT Number PCT/JP03/12875

PCT Pub. Number WO2004/034148

Priority 2002-295777 09.10.02 JP; 2003-126886 02.05.03 JP

Filing date 8 October 2003

Wipo publication date 4 May 2004

International Classifications

G03F 007/11 Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces - having cover layers or intermediate layers, e.g. subbing layers

H01L 021/027 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Event Publications

15 January 2004 Complete Application Filed

  Priority application(s): 2002-295777 09.10.02 JP; 2003-126886 02.05.03 JP

3 June 2004 Application Open to Public Inspection

  Published as AU-A-2003271123

30 June 2005 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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