Method for forming thin film and apparatus therefor

Details for Australian Patent Application No. 2003271089 (hide)

Owner Ishikawajima-Harima Heavy Industries Co., Ltd.

Inventors Ueda, Masashi; Ito, Norikazu; Takagi, Tomoko

Agent Spruson & Ferguson

Pub. Number AU-B-2003271089

PCT Number PCT/JP03/12722

PCT Pub. Number WO2004/031443

Priority 2002-292948 04.10.02 JP

Filing date 3 October 2003

Wipo publication date 23 April 2004

Acceptance publication date 19 March 2009

International Classifications

C23C 16/509 (2006.01) Chemical deposition or plating by decomposition

H01L 31/18 (2006.01) Semiconductor devices sensitive to infra-red radiation, light, electromagnetic radiation of shorter wavelength, or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation - Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof

Event Publications

15 January 2004 Complete Application Filed

  Priority application(s): 2002-292948 04.10.02 JP

27 May 2004 Application Open to Public Inspection

  Published as AU-B-2003271089

19 March 2009 Application Accepted

  Published as AU-B-2003271089

16 July 2009 Standard Patent Sealed

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