SYSTEM FOR IN-SITU GENERATION OF FLUORINE RADICALS AND/OR FLUORINE-CONTAINING INTERHALOGEN (XFN) COMPOUNDS FOR USE IN CLEANING SEMICONDUCTOR PROCESSING CHAMBERS

Details for Australian Patent Application No. 2003270859 (hide)

Event Publications

15 January 2004 Complete Application Filed

Priority application(s): 10/065,219 26.09.02 US

20 May 2004 Application Open to Public Inspection

Published as AU-A-2003270859

30 June 2005 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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