POLISHING MEDIA FOR CHEMICAL MECHANICAL PLANARIZATION (CMP)

Details for Australian Patent Application No. 2003270725 (hide)

Owner LAM RESEARCH CORPORATION

Inventors LIN, Jibing; CHARATAN, Robert

Pub. Number AU-A-2003270725

PCT Number PCT/US03/29243

PCT Pub. Number WO2004/026983

Priority 10/251,324 20.09.02 US; 10/367,439 14.02.03 US

Filing date 18 September 2003

Wipo publication date 8 April 2004

International Classifications

C09G 001/16 Polishing compositions

B24D 013/14 Wheels having flexibly-acting working parts, e.g. buffing wheels

B24D 013/12 Wheels having flexibly-acting working parts, e.g. buffing wheels

H01L 021/304 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

B24B 037/04 Lapping machines or devices, i.e. requiring pulverulent abrading substances inserted between a lap of relatively soft but rigid material and the surface to be lapped - designed for working plane surfaces

Event Publications

15 January 2004 Complete Application Filed

  Priority application(s): 10/251,324 20.09.02 US; 10/367,439 14.02.03 US

20 May 2004 Application Open to Public Inspection

  Published as AU-A-2003270725

30 June 2005 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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