STAGE DEVICE AND EXPOSURE DEVICE

Details for Australian Patent Application No. 2003268662 (hide)

Owner NIKON CORPORATION

Inventors TANAKA, Keiichi

Pub. Number AU-A-2003268662

PCT Number PCT/JP03/12136

PCT Pub. Number WO2004/032212

Priority 2002-292156 04.10.02 JP

Filing date 24 September 2003

Wipo publication date 23 April 2004

International Classifications

H01L 021/027 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

G03F 007/20 Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces - Exposure

G12B 005/00 Adjusting position or attitude, e.g. level, of instruments or other apparatus, or of parts thereof

H01L 021/68 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Event Publications

8 January 2004 Complete Application Filed

  Priority application(s): 2002-292156 04.10.02 JP

27 May 2004 Application Open to Public Inspection

  Published as AU-A-2003268662

23 June 2005 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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