SYSTEM FOR AND METHOD OF GAS CLUSTER ION BEAM PROCESSING

Details for Australian Patent Application No. 2003267263 (hide)

Owner EPION CORPORATION

Inventors MACK, Michael, E.

Pub. Number AU-A-2003267263

PCT Number PCT/US03/29240

PCT Pub. Number WO2004/027813

Priority 60/412,931 23.09.02 US

Filing date 19 September 2003

Wipo publication date 8 April 2004

International Classifications

H01J 037/08 Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof - Ion sources

C23C 014/35 Coating by vacuum evaporation, by sputtering or by ion implantation - by application of a magnetic field, e.g. magnetron sputtering

Event Publications

8 January 2004 Complete Application Filed

  Priority application(s): 60/412,931 23.09.02 US

20 May 2004 Application Open to Public Inspection

  Published as AU-A-2003267263

16 June 2005 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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