HARDMASK EMPLOYING MULTIPLE LAYERS OF SILICON OXYNITRIDE

Details for Australian Patent Application No. 2003267115 (hide)

Owner ADVANCED MICRO DEVICES, INC.

Inventors GAO, Pei-Yuan; YOU, Lu; HUANG, Richard, J.

Pub. Number AU-A-2003267115

PCT Number PCT/US03/28452

PCT Pub. Number WO2004/032221

Priority 10/256,368 27.09.02 US

Filing date 10 September 2003

Wipo publication date 23 April 2004

International Classifications

H01L 021/3213 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

H01L 021/033 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Event Publications

8 January 2004 Complete Application Filed

  Priority application(s): 10/256,368 27.09.02 US

27 May 2004 Application Open to Public Inspection

  Published as AU-A-2003267115

16 June 2005 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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