PRECURSOR MATERIAL DELIVERY SYSTEM FOR ATOMIC LAYER DEPOSITION

Details for Australian Patent Application No. 2003267107 (hide)

Owner PLANAR SYSTEMS, INC.

Inventors KUOSMANEN, Pekka; HARKONEN, Kari; SONNINEN, Martti; AITCHISON, Bradley, J.; MAULA, Jarmo; LESKINEN, Hannu; LANG, Teemu

Pub. Number AU-A-2003267107

PCT Number PCT/US03/28436

PCT Pub. Number WO2004/024981

Priority 60/410,067 11.09.02 US; 10/400,054 25.03.03 US

Filing date 10 September 2003

Wipo publication date 30 April 2004

International Classifications

C23C 016/44 Chemical deposition or plating by decomposition - characterised by the method of coating

C23C 016/455 Chemical deposition or plating by decomposition - characterised by the method used for introducing gases into the reaction chamber or for modifying gas flows in the reaction chamber

C30B 025/14 Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour deposition growth - Feed and outlet means for the gases

Event Publications

8 January 2004 Complete Application Filed

  Priority application(s): 60/410,067 11.09.02 US; 10/400,054 25.03.03 US

20 May 2004 Application Open to Public Inspection

  Published as AU-A-2003267107

16 June 2005 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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