METHOD FOR FORMING A NICKEL SILICIDE LAYER ON A SILICON SUBSTRATE

Details for Australian Patent Application No. 2003266984 (hide)

Owner INSTITUTE OF MATERIALS RESEARCH AND ENGINEERING

Inventors LAHIRI, Syamal, Kumar; CHUA, Soo, Jin; CHI, Dongzhi; LEE, Rinus, Tek, Po

Pub. Number AU-A-2003266984

PCT Number PCT/SG03/00096

PCT Pub. Number WO2003/096407

Priority 200202489-1 25.04.02 SG

Filing date 25 April 2003

Wipo publication date 11 November 2003

International Classifications

H01L 021/44 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

H01L 021/283 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

H01L 021/24 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

H01L 021/4763 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

H01L 029/45 Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having at least one potential-jump barrier or surface barrier

Event Publications

8 January 2004 Complete Application Filed

  Priority application(s): 200202489-1 25.04.02 SG

15 January 2004 Application Open to Public Inspection

  Published as AU-A-2003266984

16 June 2005 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

25 August 2005 Corrigenda

  Applications OPI - Name Index Under the name INSTITUTE OF MATERIALS RESEARCH AND ENGINEERING, Application No. 2003266984, under INID (71) correct the name to read NATIONAL UNIVERSITY OF SINGAPORE; AEROJET-GENERAL CORPORATION

24 December 2009 Corrigenda

  Applications OPI - Name Index Under the name Institute of Materials Research and Engineering , Application No. 2003266984 , under INID (43) correct the Corrigenda publication date to read 24.11.2003

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