ALKYL PUSH FLOW FOR VERTICAL FLOW ROTATING DISK REACTORS

Details for Australian Patent Application No. 2003265542 (hide)

Owner EMCORE CORPORATION

Inventors HOFFMAN, Richard; CRUEL, Jonathan; KADINSKI, Lev; RAMER, Jeffrey, C.; ARMOUR, Eric; MURPHY, Michael

Pub. Number AU-A-2003265542

PCT Number PCT/US03/26112

PCT Pub. Number WO2005/019496

Filing date 20 August 2003

Wipo publication date 10 March 2005

International Classifications

C23C 016/00 Chemical deposition or plating by decomposition

C23C 016/455 Chemical deposition or plating by decomposition - characterised by the method used for introducing gases into the reaction chamber or for modifying gas flows in the reaction chamber

C30B 025/02 Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour deposition growth - Epitaxial-layer growth

C23C 016/06 Chemical deposition or plating by decomposition - characterised by the deposition of metallic material

Event Publications

18 December 2003 Complete Application Filed

21 April 2005 Application Open to Public Inspection

  Published as AU-A-2003265542

4 May 2006 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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