ATOMIC LAYER DEPOSITION OF HIGH K METAL OXIDES

Details for Australian Patent Application No. 2003263872 (hide)

Event Publications

11 December 2003 Complete Application Filed

Priority application(s): 60/404,372 18.08.02 US

22 April 2004 Application Open to Public Inspection

Published as AU-A-2003263872

9 June 2005 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

25 August 2005 Corrigenda

Applications OPI - Name Index Under the name ASML US, INC., Application No. 2003263872, under INID (71) correct the name to read INTEGRATED PROCESS SYSTEMS LTD; ASML US, INC.

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