A METHOD OF PREPARING A THIN LAYER, THE METHOD INCLUDING A STEP OF CORRECTING THICKNESS BY SACRIFICIAL OXIDATION, AND AN ASSOCIATED MACHINE

Details for Australian Patent Application No. 2003263391 (hide)

Owner S.O.I.TEC SILICON ON INSULATOR TECHNOLOGIES

Inventors OSTERNAUD, Benedite; GHYSELEN, Bruno; AULNETTE, Cecile

Pub. Number AU-A-2003263391

PCT Number PCT/IB03/03640

PCT Pub. Number WO2004/015759

Priority 02/10208 12.08.02 FR; 02/10209 12.08.02 FR; 60/467,241 30.04.03 US

Filing date 11 August 2003

Wipo publication date 25 February 2004

International Classifications

H01L 021/66 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof - Testing or measuring during manufacture or treatment

Event Publications

11 December 2003 Complete Application Filed

  Priority application(s): 02/10208 12.08.02 FR; 02/10209 12.08.02 FR; 60/467,241 30.04.03 US

8 April 2004 Application Open to Public Inspection

  Published as AU-A-2003263391

2 June 2005 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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