METHOD FOR REMOVING PHOTORESIST AND ETCH RESIDUES

Details for Australian Patent Application No. 2003262408 (hide)

Owner TOKYO ELECTRON LIMITED

Inventors HAGIWARA, Masaaki; NISHIMURA, Eiichi; INAZAWA, Kouichiro; BALASUBRAMANIAM, Vaidyanathan

Pub. Number AU-A-2003262408

PCT Number PCT/US03/00032

PCT Pub. Number WO2003/090270

Priority 10/259,768 30.09.02 US; 60/372,446 16.04.02 US

Filing date 17 January 2003

Wipo publication date 3 November 2003

International Classifications

H01L 021/3065 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Event Publications

4 December 2003 Complete Application Filed

  Priority application(s): 10/259,768 30.09.02 US; 60/372,446 16.04.02 US

11 December 2003 Application Open to Public Inspection

  Published as AU-A-2003262408

2 June 2005 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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