COMPOSITION SENSITIVE TO VISIBLE LIGHT

Details for Australian Patent Application No. 2003262255 (hide)

Owner KYOWA YUKA CO., LTD.

Inventors SHIMIZU, Ikuo; YAMAOKA, Tsuguo; ITO, Katsuhiro; IWASAKI, Tsuyoshi

Pub. Number AU-A-2003262255

PCT Number PCT/JP03/10534

PCT Pub. Number WO2004/019131

Priority 2002-238714 20.08.02 JP

Filing date 20 August 2003

Wipo publication date 11 March 2004

International Classifications

G03F 007/039 Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces - Macromolecular compounds which are photodegradable, e.g. positive electron resists

G03F 007/004 Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces - Photosensitive materials

C08F 020/26 Homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide, or nitrile thereof

Event Publications

27 November 2003 Complete Application Filed

  Priority application(s): 2002-238714 20.08.02 JP

22 April 2004 Application Open to Public Inspection

  Published as AU-A-2003262255

2 June 2005 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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