PHOTORESIST BASE MATERIAL, METHOD FOR PURIFICATION THEREOF, AND PHOTORESIST COMPOSITIONS

Details for Australian Patent Application No. 2003261865 (hide)

Owner IDEMITSU KOSAN CO., LTD.

Inventors UEDA, Mitsuru; ISHII, Hirotoshi

Pub. Number AU-A-2003261865

PCT Number PCT/JP03/11137

PCT Pub. Number WO2004/036315

Priority 2002/300144 15.10.02 JP; 2003/112458 17.04.03 JP

Filing date 1 September 2003

Wipo publication date 4 May 2004

International Classifications

G03F 007/039 Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces - Macromolecular compounds which are photodegradable, e.g. positive electron resists

C07C 039/17 Compounds having at least one hydroxy or O-metal group bound to a carbon atom of a six-membered aromatic ring

C07C 069/736 Esters of carboxylic acids

C07D 309/04 Heterocyclic compounds containing six-membered rings having one oxygen atom as the only ring hetero atom, not condensed with other rings

Event Publications

27 November 2003 Complete Application Filed

  Priority application(s): 2002/300144 15.10.02 JP; 2003/112458 17.04.03 JP

10 June 2004 Application Open to Public Inspection

  Published as AU-A-2003261865

30 June 2005 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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