METHOD OF ELIMINATING BORON CONTAMINATION OF ANNEALED WAFER

Details for Australian Patent Application No. 2003261789 (hide)

Owner SUMITOMO MITSUBISHI SILICON CORPORATION

Inventors BAE, So Ik; NAKADA, Yoshinobu; KANEKO, Kenichi

Pub. Number AU-A-2003261789

PCT Number PCT/JP03/10934

PCT Pub. Number WO2004/021428

Priority 2002/252608 30.08.02 JP

Filing date 28 August 2003

Wipo publication date 19 March 2004

International Classifications

H01L 021/324 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Event Publications

27 November 2003 Complete Application Filed

  Priority application(s): 2002/252608 30.08.02 JP

6 May 2004 Application Open to Public Inspection

  Published as AU-A-2003261789

2 June 2005 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

Legal

The information provided by the Site not in the nature of legal or other professional advice. The information provided by the Site is derived from third parties and may contain errors. You must make your own enquiries and seek independent advice from the relevant industry professionals before acting or relying on any information contained herein. Check the above data against the Australian Patent Office AUSPAT database.

Next and Previous Patents/Applications

2003261790-PLASMA PROCESSING METHOD AND PLASMA PROCESSING DEVICE

2003261788-ULTRASONIC THERAPY APPARATUS