ATOMIC DEPOSITION LAYER METHODS

Details for Australian Patent Application No. 2003261211 (hide)

Owner MICRON TECHNOLOGY, INC.

Inventors SANDHU, Gurtej, S.; CASTROVILLO, Paul, J.; BASCERI, Cem; DERDERIAN, Garo, J.

Pub. Number AU-A-2003261211

PCT Number PCT/US03/22804

PCT Pub. Number WO2004/011693

Priority 10/208,314 29.07.02 US

Filing date 21 July 2003

Wipo publication date 16 February 2004

International Classifications

C23C 016/44 Chemical deposition or plating by decomposition - characterised by the method of coating

C30B 025/14 Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour deposition growth - Feed and outlet means for the gases

Event Publications

20 November 2003 Complete Application Filed

  Priority application(s): 10/208,314 29.07.02 US

25 March 2004 Application Open to Public Inspection

  Published as AU-A-2003261211

26 May 2005 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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