LOW TERMPERATURE DEPOSITION OF SILICON OXIDES AND OXYNITRIDES

Details for Australian Patent Application No. 2003259950 (hide)

Owner ASML US, INC.

Inventors SENZAKI, Yoshihide; LEE, Sang-In; LEE, Sang-Kyoo

Pub. Number AU-A-2003259950

PCT Number PCT/US03/26083

PCT Pub. Number WO2004/017383

Priority 60/404,363 18.08.02 US

Filing date 18 August 2003

Wipo publication date 3 March 2004

Event Publications

20 November 2003 Complete Application Filed

  Priority application(s): 60/404,363 18.08.02 US

22 April 2004 Application Open to Public Inspection

  Published as AU-A-2003259950

26 May 2005 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

25 August 2005 Corrigenda

  Applications OPI - Name Index Under the name ASML US, INC., Application No. 2003259950, under INID (71) correct the name to read Aviza Technology, Inc.; INTEGRATED PROCESS SYSTEMS LTD

Legal

The information provided by the Site not in the nature of legal or other professional advice. The information provided by the Site is derived from third parties and may contain errors. You must make your own enquiries and seek independent advice from the relevant industry professionals before acting or relying on any information contained herein. Check the above data against the Australian Patent Office AUSPAT database.

Next and Previous Patents/Applications

2003259951-FLUORINATED POLYMERS USEFUL AS PHOTORESISTS, AND PROCESSES FOR MICROLITHOGRAPHY

2003259949-FACE MASK SUPPORT