PHOTORESISTS, FLUOROPOLYMERS AND PROCESSES FOR 157 NM MICROLITHOGRAPHY

Details for Australian Patent Application No. 2003259729 (hide)

Owner E. I. DU PONT DE NEMOURS AND COMPANY

Inventors FEIRING, Andrew, E.; SCHADT, Frank, L., III; PETROV, Viacheslav Alexandrovich; SMART, Bruce, Edmund; FARNHAM, William, Brown

Pub. Number AU-A-2003259729

PCT Number PCT/US03/25023

PCT Pub. Number WO2004/022612

Priority 60/402,225 09.08.02 US

Filing date 8 August 2003

Wipo publication date 29 March 2004

International Classifications

C08F 014/18 Homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen

G03C 001/73 Photosensitive materials - containing organic compounds

Event Publications

20 November 2003 Complete Application Filed

  Priority application(s): 60/402,225 09.08.02 US

13 May 2004 Application Open to Public Inspection

  Published as AU-A-2003259729

26 May 2005 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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