METHOD AND COMPOSITIONS FOR HARDENING PHOTORESIST IN ETCHING PROCESSES

Details for Australian Patent Application No. 2003257999 (hide)

Owner LAM RESERACH CORPORATION

Inventors TAYLOR, Yousun, Kim; NGUYEN, Wendy; LEE, Chris, G., N.

Pub. Number AU-A-2003257999

PCT Number PCT/US03/24137

PCT Pub. Number WO2004/017390

Priority 10/219,995 14.08.02 US

Filing date 31 July 2003

Wipo publication date 3 March 2004

International Classifications

H01L 021/027 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

H01L 021/308 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

H01L 021/3213 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

H01L 021/311 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Event Publications

13 November 2003 Complete Application Filed

  Priority application(s): 10/219,995 14.08.02 US

22 April 2004 Application Open to Public Inspection

  Published as AU-A-2003257999

19 May 2005 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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