Owner TOKYO ELECTRON LIMITED

Inventors KANNAN, Hiroshi; ISHIZAKA, Tadahiro; KOJIMA, Yasuhiko; OSHIMA, Yasuhiro; SHIGEOKA, Takashi

Pub. Number AU-A-2003254942

PCT Number PCT/JP03/10377

PCT Pub. Number WO2004/021415

Priority 2002-253674 30.08.02 JP

Filing date 15 August 2003

Wipo publication date 19 March 2004

H01L 021/02 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof -

H01L 021/285 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

H01L 021/31 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

C23C 016/52 Chemical deposition or plating by decomposition - Controlling or regulating the coating process

C23C 016/455 Chemical deposition or plating by decomposition - characterised by the method used for introducing gases into the reaction chamber or for modifying gas flows in the reaction chamber