METHOD FOR REDUCING PATTERN DEFORMATION AND PHOTORESIST POISONING IN SEMICONDUCTOR DEVICE FABRICATION

Details for Australian Patent Application No. 2003254254 (hide)

Owner ADVANCED MICRO DEVICES, INC.

Inventors CHANG, Mark, S.; GAO, Pei-Yuan; WRIGHT, Marilyn, I.; YOU, Lu; DAKSHINA-MURTHY, Srikanteswara; BONSER, Douglas, J.; PLAT, Marina, V.; YANG, Chih, Yuh; BELL, Scott, A.; CHAN, Darin, A.; FISHER, Philip, A.; LYONS, Christopher, F.

Pub. Number AU-A-2003254254

PCT Number PCT/US03/23746

PCT Pub. Number WO2004/012246

Priority 60/400,453 31.07.02 US; 10/334,392 30.12.02 US

Filing date 29 July 2003

Wipo publication date 16 February 2004

International Classifications

H01L 021/033 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Event Publications

30 October 2003 Complete Application Filed

  Priority application(s): 60/400,453 31.07.02 US; 10/334,392 30.12.02 US

25 March 2004 Application Open to Public Inspection

  Published as AU-A-2003254254

5 May 2005 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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