COMPOSITIONS AND METHOD FOR REMOVING PHOTORESIST AND/OR RESIST RESIDUE AT PRESSURES RANGING FROM AMBIENT TO SUPERCRITICAL

Details for Australian Patent Application No. 2003253961 (hide)

International Classifications

Event Publications

30 October 2003 Complete Application Filed

Priority application(s): 10/620,895 16.07.03 US; 10/620,895 16.07.03 US; 10/197,384 17.07.02 US

18 March 2004 Application Open to Public Inspection

Published as AU-A-2003253961

28 April 2005 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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