METHOD OF MAKING AN INTEGRATED CIRCUIT USING A PHOTOMASK HAVING A DUAL ANTIREFLECTIVE COATING

Details for Australian Patent Application No. 2003252099 (hide)

Owner MOTOROLA, INC.

Inventors WU, Wei, E.; POSTNIKOV, Sergei, V.

Pub. Number AU-A-2003252099

PCT Number PCT/US03/22849

PCT Pub. Number WO2004/032204

Priority 10/260,318 30.09.02 US

Filing date 22 July 2003

Wipo publication date 23 April 2004

International Classifications

H01L 021/00 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Event Publications

16 October 2003 Complete Application Filed

  Priority application(s): 10/260,318 30.09.02 US

27 May 2004 Application Open to Public Inspection

  Published as AU-A-2003252099

16 June 2005 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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