POLYMERIZABLE COMPOSITION, POLYMER, RESIST, AND LITHOGRAPHY METHODS

Details for Australian Patent Application No. 2003250802 (hide)

Owner INFINEON TECHNOLOGIES AG

Inventors ELIAN, Klaus

Pub. Number AU-A-2003250802

PCT Number PCT/DE03/02502

PCT Pub. Number WO2004/017142

Priority 102 33 849.3 22.07.02 DE

Filing date 21 July 2003

Wipo publication date 3 March 2004

International Classifications

G03F 007/075 Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces - Silicon-containing compounds

G03F 007/039 Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces - Macromolecular compounds which are photodegradable, e.g. positive electron resists

C08F 030/08 Homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal

C08F 230/08 Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium, or a metal

Event Publications

16 October 2003 Complete Application Filed

  Priority application(s): 102 33 849.3 22.07.02 DE

22 April 2004 Application Open to Public Inspection

  Published as AU-A-2003250802

14 April 2005 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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