METAL ORGANIC CHEMICAL VAPOR DEPOSITION AND ATOMIC LAYER DEPOSITION OF METAL OXYNITRIDE AND METAL SILICON OXYNITRIDE

Details for Australian Patent Application No. 2003249254 (hide)

Owner ASML US, INC.

Inventors SENZAKI, Yoshihide; LEE, Sang-In

Pub. Number AU-A-2003249254

PCT Number PCT/US03/22060

PCT Pub. Number WO2004/010466

Priority 60/396,744 19.07.02 US

Filing date 16 July 2003

Wipo publication date 9 February 2004

Event Publications

16 October 2003 Complete Application Filed

  Priority application(s): 60/396,744 19.07.02 US

18 March 2004 Application Open to Public Inspection

  Published as AU-A-2003249254

7 April 2005 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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