VAPOR DEPOSITION OF TUNGSTEN NITRIDE

Details for Australian Patent Application No. 2003248850 (hide)

Owner PRESIDENT AND FELLOWS OF HARVARD COLLEGE

Inventors GORDON, Roy, G.; SUH, Seigi; BECKER, Jill

Pub. Number AU-A-2003248850

PCT Number PCT/US03/21281

PCT Pub. Number WO2004/007796

Priority 60/395,572 12.07.02 US

Filing date 9 July 2003

Wipo publication date 2 February 2004

International Classifications

C23C 016/34 Chemical deposition or plating by decomposition - Nitrides

C07F 011/00 Compounds containing elements of the 6th Group of the Periodic System

H01L 021/768 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

H01L 021/02 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof -

Event Publications

16 October 2003 Complete Application Filed

  Priority application(s): 60/395,572 12.07.02 US

18 March 2004 Application Open to Public Inspection

  Published as AU-A-2003248850

7 April 2005 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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